PUB-2015-ATS

A two-step annealing process for enhancing the ferroelectric properties of poly(vinylidene fluoride) (PVDF) devices

Ji Hoon Park,a Narendra Kurra,a M. N. AlMadhoun,b Ihab N. Odehb and H. N. Alshareef,"A two-step annealing process for enhancing the ferroelectric properties of poly(vinylidene fluoride) (PVDF) devices"
​J. Mater. Chem. C, 2015, 3, 2366–2370​
Ji Hoon Park, a Narendra Kurra, a M. N. AlMadhoun, b Ihab N. Odehb and H. N. Alshareef
ferroelectric properties, annealing
2015
​We report a simple two-step annealing scheme for the fabrication of stable non-volatile memory devices employing poly(vinylidene fluoride) (PVDF) polymer thin-films. The proposed two-step annealing scheme comprises the crystallization of the ferroelectric gamma-phase during the first step and enhancement of the PVDF film dense morphology during the second step. Moreover, when we extended the processing time of the second step, we obtained good hysteresis curves down to 1 Hz, the first such report for ferroelectric PVDF films. The PVDF films also exhibit a coercive field of 113 MV m1 and a ferroelectric polarization of 5.4 mC cm2 .