LIST OF PUBLICATIONS (** denotes KAUST affiliation).
1.     **R.B. Rakhi, W. Chen, D.K. Cha, and H.N. Alshareef, “Nanostructured Composite Electrodes for Energy Storage Applications”, Advanced Energy Materials (submitted).
    2.     **S.R.S Kumar, Dongkyu Cha, and H.N. Alshareef, “Substrate dependent transport properties of double-filled CoSb3 Thermoelectric thin films”, J. Applied Physics (under review).
    2.     **M. Liangbing, W. Chen, H.N. Alshareef, and Yi. Cui, “Mass Loading of MnO2-Carbon Nanotube Electrodes for Textile Pseudocapacitors”, ACS Nano (accepted).

    4.     **M.A. Khan, U. Bhansali and H.N. Alshareef, “All-Polymer, Transparent and Flexible Ferroelectric Memory Device”, Organic Electronics (accepted).
    5.     **Mahmoud Al Ahmad, A. M. Elshurafa, K. N. Salama, and H. N. Alshareef, “Determination of Maximum Power Transfer Conditions of Bimorph Piezoelectric Energy Harvesters”, J. Applied Physics (under review).
    6.     **W. Chen, R.B. Rakhi, M. Liangbing, Xing Xie, Y. Cui, and H.N. Alshareef, “High Performance Supercapacitors on a Sponge”, Nano Letters (under review).
    7.     **J.J. Pulikkotil, H. N. Alshareef, and Udo Schwingenschlogl, “Role of FeSb6 octahedral deformations for the electronic structure of LaFe4Sb12”, Chemical Physics Letters (accepted).
    8.     **Xing Xie, Meng Ye, Liangbing Hu, Nian Liu, James R. McDonough, Wei Chen, H. N. Alshareef, Craig S. Criddle and Yi Cui, “Carbon Nanotube on Macroporous Sponge for Microbial Fuel Cells”,  Energy & Environmental Science, (accepted).
    9.     **R.B. Rakhi, W. Chen, D.K. Cha, and H.N. Alshareef, “High Performance Supercapacitors Using Electrodes Incorporating Metal Oxide Nanoparticles Anchored onto Graphene Nanosheets”, J. Materials Chemistry (accepted).
    10.  **Mahmoud Al Ahmad and H. N. Alshareef, “Energy Harvesting from Radio Frequency Propagation Using Piezoelectric Cantilevers”, Solid State Electronics  (accepted).
    11.  **R.B. Rakhi and H.N. Alshareef, “Enhancement of the Energy Storage of Supercapacitors using Graphene Based Nanocomposite Electrodes”, J. Power Sources 196, 8858 (2011)
    12.  **S.R.S Kumar, T. Tritt, A. Alyamani, and H.N. Alshareef, “Pulsed Laser Deposition & Thermoelectric Properties of Double-Filled Skutterudite Thin Films”, J. Materials Research 26, 1836 (2011).
    13.  **E. Fuentes, L. Baldenegro, M. A. Quevdo-Lopez, Bruce Gnade, P. Shah, A. Hande, H.N. Alshareef, “Optimization of Pb(Zr0.53,Ti0.47)O3 films for micropower generation using integrated cantilevers”, Solid State Electronics 63, 89 (2011).
    14.  **R.B. Rakhi, W. Chen, D.K. Cha, and H.N. Alshareef, “Energy Storage Devices with Electrodes Incorporating Carbon Nanocoils & Metal Oxide Nanoparticles”, J. Phys. Chem. C 115 (29), 14392 (2011).
    15.  **Mahmoud AlAhmad, A. M. Elshurafa, K. N. Salama, and H.N. Alshareef, “Modeling of MEMS piezoelectric energy harvesters using electromagnetic and power system theories”, Smart Materials & Structures 20, 085001(2011).
    16.  **W.T. Wondmagegn, N. T.Satyala, I. Mehia-Silva, M.A. Quevedo-Lopez, S. Gowrisanker, H.N. Alshareef H.J. Stiegler B.E. Gnade, “Experimental and modeling study of the capacitance–voltage characteristics of metal–insulator–semiconductor capacitor based on pentacene/ parylene”, Thin Solid Films, 519,4313 (2011).
    17.  **W.T. Wondmagegn, N. T. Satyala, R.J. Pieper ·M.A. Quevedo-Lopez, S. Gowrisanker, H.N. Alshareef H.J. Stiegler B.E. Gnade, “Impact of semiconductor/metal interfaces on contact resistance and operating speed of organic thin film transistors ”, J. Computational Electronics, 10,144 (2011).
    18.  **Mahmoud AlAhmad and H. N. Alshareef, “Modeling the Power Output of Piezoelectric Energy Harvester”, J. Electronic Materials 40, 1477(2011).
    19.  **M.A. Quevedo-Lopez, W. T. Wondmagegn, H. N. Alshareef, R. Ramirez-Bon, and B. E Gnade,“Thin Film Transistors for Flexible Electronics: Contacts, Dielectrics and Semiconductors”, J. Nanoscience & Nanotechnology 11, 5532(2011).
    20.  **H.N. Alshareef, M.A. Quevedo-Lopez, R. Mure, and P. Majhi, “Depth Profiling of La2O3/HfO2 Stacked Dielectrics for Nanoelectronic Device Applications”, Electrochemical & Solid State Letters, 14, H139 (2011).
    21.  **H.N. Alshareef, M.A. Quevedo, P. Majhi., Guest Editor’s Article, “Electrical Contacts to Nanoelectronics”, Materials Research Society (MRS) Bulletin 36 (2), 90 (2011).  
    22.  **H.N. Alshareef, A.J. Caraveo-Frescas, and D.K. Cha, “Nanoscale Gadolinium Oxide Capping Layers on Compositionally Variant Gate Dielectric”, Applied Physics Letters 97, 202108 (2010).
    23.  **G. Gutierrez-Heredia, L. A. Gonzalez, H.N. Alshareef, B E Gnade, and M. Quevedo-Lopez, “Flexible organic active matrix circuit fabricated using novel organic thin film transistors and organic light-emitting diodes”, Semicond. Sci. Technol. 25, 115001(2010).
    24.  **E. Fuentes, W. Debray, P. Shah, A. Hande, M. Quevedo-Lopez, Bruce Gnade, and H.N. Alshareef, Fabrication and Characterization of Pb(Zr,Ti)O3–Pb(Nb1/3 Zn2/3)O3 thin film and cantilevers, J. Electronic Materials, Volume 40, Number 1, 85(2010).
    25.  **Mahmoud Al Ahmad and H. N. Alshareef, “A Capacitance-Based Methodology for the Estimation of Piezoelectric Coefficients of Poled Piezoelectric Materials”, Electrochemical & Solid State Letters, vol 13(12), G108-110(2010).
    26.  **S.R.S Kumar, N. M. Hedhili, and H.N. Alshareef, “Charge State of Manganese and its Influence on Mn-In2O3 Dilute Magnetic Semiconductors, Applied Physics Letters 97, 111909 (2010).
    27.  **J.J. Pulikkotil, H. N. Alshareef, and U. Schwingenschlogl, “Variation of equation of state parameters in the Mg2(Si1−xSnx) alloys”, J. Phys.: Cond. Matter 22 (2010) 352204.
    28.  **A. Salas-Villasenor, B. Gnade, H.N. Alshareef; D. Cha; R. Ramirez Bon; J. M. Silva, J. Horvath, "Impact of Gate Dielectric on Carrier Mobility in Low Temperature Chalcogenide Thin Film Transistors for Flexible Electronics”, Electrochemical & Solid State Letters 13 (9), II313-II316 (2010).
    29.  **C. L. Hinkle, R.Chapman, E. M. Vogel, H. N. Alshareef, C. Freeman, E. Wimmer, H. Niimi, A. Li-Fatou, J. B. Shaw, and J. J. Chambers, “Interfacial oxygen and nitrogen induced dipole formation and vacancy passivation for increased effective work functions in TiN/HfO2 gate stacks”, Appl. Phys Lett. 96, 103502 (2010).
    30.  **K. Xiong, W. Wang, H. N. Alshareef, R. Gupta, J. B. White, B. E. Gnade, and K.J. ChoElectronic structures and stability of Ni/Bi2Te3 and Co/Bi2Te3 interfaces”, J. Phys. D: Appl. Phys. 43, 115303 (2010).
    31.  **D. Mao, M.A. Quevedo-Lopez, H. Stiegler, B.E. Gnade, and H.N. Alshareef,
    Optimization of Poly(vinylidene fluoride-trifluoroethylene) Films as Non-volatile Memory for Flexible Electronics”, Organic Electronics 11,925(2010).
    32.  **Rahul P. Gupta, K. Xiong, J. B. White, Kyeongjae Cho, H. N. Alshareef, and B. E. Gnade, “Low Resistance Ohmic Contacts to Bi2Te3“, J. Electrochem. Soc., Vol 157, 6, H666 (2010).
    33.  **L. A. Baldenegro, W. Debray, E. Fuentes, M.A. Quevedo-Lopez, H.N. Alshareef, Pradeep Shah and B.E. Gnade “Study on the Microstructure and Electrical Properties of Pb(Zr0.53 Ti0.47)O3 Thin-films ”, Materials Science Forum  97-100, 644 (2010).
    34.  **C. L. Hinkle, R. Chapman, E. M. Vogel, H. N. Alshareef, C. Freeman, E. Wimmer, H. Niimi, A. Li-Fatou, J. B. Shaw, and J. J. Chambers, “Dipole Controlled Metal Gate with Hybrid Low Resistivity Cladding for Gate-Last CMOS with Low Vt”, VLSI Technology Symposium 2010, June, 2010.
    35.  **M.D. Morales-Acosta, H. N. Alshareef, B. Gnade, R. Ramirez-Bon and M.A. Quevedo-López” Dielectric properties of PMMA-SiO2 hybrid filmsMaterials Science Forum 25-28, 644 (2010).
    36.  **L.A. García-Cerda, B.A. Puente-Urbina, M.A. Quevedo-López, B.E. Gnade, L. Baldenegro-Pérez, H.N. Alshareef, M.A. Hernández-Landaverde “Structural and morphological properties of HfxZr1-xO2 thin films prepared by Pechini routeMaterials Science Forum 113-116, 644 (2010).
    37.  **R. Ramos-González, L.A. Garcia-Cerda, H. N. Alshareef, B. E. Gnade and M.A. Quevedo-Lopez “Study of hafnium (IV) oxide nanoparticles synthesized by polymerized complex and polymer precursor derived sol-gel methods Materials Science Forum  75-78, 644 (2010).
    38.  **R. Gupta, H.N. Alshareef, D. Iyore, J. White, KJ. Cho, B. Gnade, “Characterization of Co and Ni Contacts to Bi2Te3 Thermoelectrics”, Electrochemical & Solid State Letters, Vol 12, (10), H395(2009).
    39.  S. Gowrisanker, M. Quevedo, H.N. Alshareef, and B. Gnade, R. Krishna, S. Vengupal, and D. Allee, A novel low temperature integration of hybrid CMOS devices on flexible substrates”, Organic Electronics, Vol 10, (7),1217(2009).
    40.  R. Gupta, J. White, H.N. Alshareef, and B. E. Gnade, “Calculation of Contact Resistance of Metal Contacts on Thermoelectrics Using the Cox and Strack Method”, Electrochemical and Solid State Letters  12, (8), H302(2009).
    41.  S. Gowrisanker, M. A.Quevedo, H.N. Alshareef, and B.E. Gnade, Time dependent breakdown characteristics of parylene dielectric in metal-insulator-metal capacitors, Organic Electronics, Vol  10, (5) 1024(2009).
    42.  S. Gowrisanker, Y. Ai , H. Jia, M. Quevedo, and H.N. Alshareef, R. Bennet, and B.E. Gnade, Organic Thin-Film Transistors with Low Threshold Voltage Variation on Low-Temperature Substrates, Electrochemical & Solid State Letters  12,(3), H50-H53 (2009).

    43.  Devine RAB, Mee JK, Hjalmarson HP, H.N. Alshareef et al.,  A simplified approach to estimating total trap contributions in negative bias temperature instability”, J. of Applied Physics,  106 (2),  024508(2009).
    44.  S. Gowrisanker, M.A.Quevedo-Lopez, H.N.Alshareef, B. Gnade, S. Venugopal, R. Krishna, K. Kaftanoglu, D. Allee, “Low Temperature Integration of Hybrid CMOS Devices on Plastic Substrates”, 2009 Flexible Electronics & DISPLAYS Conference,  61(2009).  

    45.  K. Palaniappan, J.W. Murphy, N. Khanam, H. N. Alshareef, M. A. Quevedo-Lopez, M. C. Biewer, S. Y. Park, M. J. Kim, B. E. Gnade, M. C. Stefan, “Poly(3-hexylthiophene)-CdSe Quantum Dot Bulk Heterojunction Solar Cells: The Influence of the Functional End-Group of the Polymer”, Macromolecules 42, (12) 3845(2009).
    46.  D.R. Allee, S. Venugopal, R. Krishna, K. Kaftanoglu, M.A. Quevedo-Lopez, S. Gowrisanker, A. E. Avendano-Bolivar, H. N. Alshareef, B. Gnade, “Flexible CMOS and Electrophoretic DisplaysInvited Paper, 2009 SID International Symposium Digest of Technical Papers, Vol XL, BOOKS I - III (2009).
    47.  S. Gowrisanker, Y. Ai, H. Jia, M. A. Quevedo-Lopez, H. N. Alshareef, I. Trachtenberg, H. Stiegler, H. Edwards, R. Barnett, and B. E. Gnade, “Organic Thin-film Transistors with Low Threshold Voltage Variation on Low Temperature SubstratesElectrochemical and Solid-State Letters, 12(3) H50-H53 (2009).
    48.  D. Iyore, O. D. Iyore, T. H. Lee, R. P. Gupta, J. B. White, H. N. Alshareef, M. J. Kim and B.E. Gnade, “Interface Characterization of Nickel Contacts to Bulk Bismuth Tellurium Selenide”,  Surface and Interface Analysis, 41, 440(2009).
    49.  U. Bhansali, M.A. Quevedo, H.P. Jia, H.N. Alshareef, D.K. Cha, M. Kim, and B.E. Gnade, “Characterization of organic thin films using transmission electron microscopy and Fourier Transform Infra Red spectroscopy”, Thin Solid Films, 517 (20), 5825(2009).

    50.  H.N. Alshareef, M. Quevedo, H.C. Wen, C. Huffman, M. El-Bounani and B.A. Gnade,  Impact of carbon incorporation on the effective work function of WN and TaN metal gate electrodes”, Electrochemical & Solid State Letters 11, H182 (2008).
    51.  G. Srinivas, Y. Ai, M. A. Quevedo, H.N. Alshareef, E. Vogel, and B.E. Gnade, “Impact of metal/semiconductor contact thickness ratio on pentacene thin film transistor performance”, Applied Physics Letters  92, 153305(2008).
    52.  P. Kirsch, …, H.N. Alshareef, “Dipole Model Explaining High-k/metal gate Field Effect Transistor Threshold Voltage Tuning”, Applied Physics Letters 92, 092901(2008).
    53.  R. A. Devine, H. Hjalmarson, H.N. Alshareef, M. A. Quevedo, “Negative Bias Temperature Instability and Relaxation in HfSiON Gate Stack Field Effect Devices”, Applied Physics Letters  92, 153512(2008).
    54.  H.C. Wen, P. Majhi, Choi K, C.S. Park, H.N. Alshareef et al., “ Decoupling the Fermi-level pinning effect and intrinsic limitations on p-type effective work function metal electrodesMicroelectronic Engineering  85, 2-8 (2008).
    55.  Devine RAB, H.N. Alshareef, Quevedo-Lopez MA , “Slow trap charging and detrapping in the negative bias temperature instability in HfSiON dielectric based field effect transistors”,
    J. Applied Physics,104 (12),  124109(2008).
    56.  R. Devine, M. A. Quevedo, and H.N. Alshareef, “Radiation Hardness of Devices with HfO2 Thin Film Dielectrics”, J. of  Applied Physics 103, 064104(2008).
    57.  H.C. Wen, S.C. Song, C.S. Park, C. Burham, G. Bursuker, M. Quevedo, K. Chio, and H.N. Alshareef, “Gate first metal-aluminum-nitride PMOS electrodes for 32nm low standby power applications”, 2007 VLSI Technology Symposium, 160 (2007)
    58.  D. A. M. Montijo, M.S. Lerma, M.Q. Lopez, M. Elbounnani, H. N. Alshareef, F.A.E. Beltran, and R. R. Bon, “Morphological and Chemical Study of the Initial Growth of CdS Thin Films Using an Ammonia-Free Process”, Applied Surface Science  254 (15), 499(2007).
    59.  H.N. Alshareef, H.R. Harlan, H.C. Wen, P. Majhi, H.F. Luan, K. Choi, B.H. Lee, R. Jammy, “Thermally Stable N-Metal Gate MOSFETs Using La-Incorporated HfSiO Dielectric”  VLSI Technology Symposium, 10 (2006).
    60.  H.N. Alshareef, M. A. Quevedo, H.C. Wen, R. Harris, P. Kirsch, Majhi P, Lee BH, Jammy R, Lichtenwalner DJ, Jur J.S., Kingon AI. “Work function engineering using lanthanum oxide interfacial layers”, Applied Physics Letters 89, 232103, (2006).
    61.  H.N. Alshareef, H.F. Luan, K. Choi, H.R. Harris, H.C. Wen, M. Quevedo-Lopez, P. Majhi, and B.H. Lee, “ Metal Gate Work Function Engineering Using AlNx Interfacial Layers” , Applied Physics Letters  88, 112114(2006).
    62.  H.N. Alshareef, K.Choi, H.C. Wen, H. Luan, H. Harris, P. Majhi, B.H. Lee, and R. Jammy, R.M. Wallace, and B. Gnade, “Composition Dependence of the Work Function of Ta1-x AlxNy Metal Gates”, Applied Physics Letters 88, 072108 (2006).
    63.  H.N. Alshareef, H.C. Wen, H.F. Luan, K. Choi, H.R. Harris, Y. Senzaki, P. Majhi, B.H. Lee, B. Foran and G. Lian “Temperature dependence of the work function of ruthenium-based gate electrodes”, Thin Solid Films , vol. 515 (4), 1294(2006).
    64.  M.P. Agustin, H.N. Alshareef, M.A. Quevedo-Lopez, and S. Stemmer, “Influence of AIN layers on the interface stability of HfO2 gate dielectric stacks“, Applied Physics Letters 89 (4), 041906 (2006).
    65.  K. Choi, H.N. Alshareef, H.C. Wen, H. Harris, H. Luan, Y. Senzaki, P. Lusaght, P. Majhi, and B.H. Lee, “Effective work function modification of atomic-layer-deposited-TaN film by capping layer” , Applied Physics Letters 89 (03), 032113 (2006).
    66.  P.Y. Hung, H. N. Alshareef, T. Lafford, D. Keith Bowen, P. Majhi and A. Diebold, Application of X-ray metrology in the characterization of metal gate thin films”, J. Vac. Sci. Technology B24,(2006): 2437-2441.
    67.  H. R. Harris, H. N. Alshareef, H.C. Wen, S. Krishnan, K. Choi, H. Luan, D. Heh, C.S. Park, H.B. Park, M. Hussain, B.S. Ju, P.D. Kirsch, S.C. Song, P. Majhi, B.H. Lee, R. Jammy “Simplified Manufacturable Band Edge Metal Gate Solution for NMOS Without a Capping Layer”, IEDM Technology Symposium, 2006.
    68.  M.M. Hussain, M. Quevedo, H.N. Alshareef, H.C. Wen , Larison D, Gnade B, El-Bouanani M. “Thermal annealing effects on a representative high-k/metal film stackSemiconductor Science And Technology, 21 (10): 1437-1440, (2006).
    69.  M.M. Hussain, M.Quevedo, H.N. Alshareef, D. Larison, B. Gnade, “Deposition method-induced stress effect on ultrathin titanium nitride etch characteristics”, Electrochemical and Solid State Letters, 9 (12): G361-G363 (2006).
    70.  M.A. Quevedo, S. Krishnan, P. Kirsch, H.N. Alshareef, B.E. Gnade, M.J. Kim, Robert Wallace, B. H. Lee,R. Jammy. “Structure-Property Relationships in Ultrathin Hf-Based Gate DielectricsFuture Fab International, Vol 21, July 01, (2006).
    71.  M. A. Quevedo-Lopez, P.D. Kirsch, S. Krishnan, H. N. Alshareef, J. Barnett, H. R. Harris, A. Neugroschel, F.S. Aguirre-Tostado, B. E. Gnade, M. J. Kim, and B.H. Lee, “Systematic Gate Stack Optimization to Maximize Mobility with HfSiON EOT Scaling”, European Solid State Device Research Conference, 113(2006).
    72.  H. C. Wen, R. N. Choi, G. A. Brown, T. Boscke, K. Matthews, H. R. Harris, K. Choi, H. N. Alshareef, H. F. Luan, G. Bersuker, P. Majhi, D. L. Kwong, and B. H. Lee, "Comparison of effective work function extraction methods using capacitance and current measurement Techniques," IEEE Electron Device Letters 27, pp. 598-601, (2006).
    73.  P. Kirsch, M. A. Quevedo-Lopez, S. A. Krishnan, C. Krug, H. N. Alshareef, C. S. Park, R. Harris, N. Moumen, A. Neugroschel, G. Bersuker, B .H. Lee, J.G. Wang, G. Pant1, B. E. Gnade, M. J. Kim, R. M. Wallace, J. S. Jur, D. J. Lichtenwalner, A. I. Kingon, and R. Jammy. “Band Edge n-MOSFETs with High-k/Metal Gate Stacks Scaled to EOT=0.9nm with Excellent Carrier Mobility and High Temperature Stability”, IEDM Technical Digest 2006, (2006).
    74.  H. Harris, S. Krishnan, H. C. Wen, H. N. Alshareef, A. Rao, L. Solis, P. Majhi, R. Choi, B. H. Lee, G. Bersuker, and G. A. Brown, "Reliability Characteristics of Metal/High-? PMOS with Top Interface Engineered Band Offset Dielectric (BOD)," IEEE International Reliability Physics Symposium, 661(2006).
    75.  H. N. Alshareef, H.C. Wen, H.R. Harris, K. Choi, H.F. Luan, P. Lysaght, P. Majhi, B.H. Lee, and M. El-Bounani, “Modulation of Silicon Work Function Using Thin TaN Interlayers”, Applied Physics Letters  87(05), 052109 (2005).
    76.  H. N. Alshareef, H. Niimi, A. Varghese, M. Bevan, R. Kuan, J. Holt, P. Tiner,  “Intrinsic reoxidation of plasma nitrided gate dielectrics”,  Applied Physics Letters 86 (13), 132901(2005).
    77.  H. N. Alshareef, Z. Zhang, P. Majhi, G. Brown, P. Zeitzoff, H. Huff, and B.H. Lee, “Gate Electrode Development for Dual Metal-Gate CMOS Applications”, Future Fab International, 19, 91(2005).
    78.  H. N. Alshareef, K. Choi, H. C. Wen, H. Harris, H. Luan, P. Lysaght, P. Majhi, and B. H. Lee, "Gate Work Function Modification Using Ultra-Thin Metal Interlayers”, Electrochemical Society Proceedings” 2005-05, 198 (2005).
    79.  H.F. Luan, H.N. Alshareef, P. S. Lysaght, H. R. Harris, H. C. Wen, K. Choi, Y. Senzaki, P. Majhi, and B. H. Lee “Evaluation of Tantalum-silicon alloys as gate electrodes”,  Applied Physics Letters 87 (21), 212110 (2005).
    80.  H.F. Luan, H. N. Alshareef, H. R. Harris, H. C. Wen, K. Choi, Y. Senzaki, P. Majhi, and B. H. Lee, “Evaluation of Titanium Silicon Nitride as Gate Electrodes for CMOS Devices”,  Applied Physics Letters 88 (14), 142113 (2005).
    81.  H. C. Wen, H. N. Alshareef, H. Luan, K. Choi, P. Lysaght, H. R. Harris, C. Huffman, G. A. Brown, G. Bersuker, P. Zeitzoff, H. Huff, P. Majhi, and B. H. Lee, "Systematic investigation of amorphous transition-metal-silicon-nitride electrodes for metal gate CMOS applications," VLSI Technology Symposium, 2005 ,46(2005).
    82.  P. Majhi, H.C. Wen, H.N. Alshareef, K. Choi, H.F. Luan, and B.H. Lee, 2005 Taiwan VLSI Technology Symposium, 105(2005).
    83.  K. Choi, P. Lysaght, H. N. Alshareef, C. Huffman, H. C. Wen, R. Harris, H. Luan, P. Y. Hung, C. Sparks, M. Cruz, K. Matthews, P. Majhi, and B. H. Lee, "Growth mechanism of TiN film on dielectric films and the effects on the work function," Thin Solid Films 486,141(2005).
    84.  H. C. Wen, P. Lysaght, H. N. Alshareef, C. Huffman, H. R. Harris, K. Choi, Y. Senzaki, H. Luan, P. Majhi, B. H. Lee, M. J. Campin, B. Foran, G. D. Lian, and D. L. Kwong, "Thermal Response of Ru electrodes in contact with SiO2 and Hf-based high-k gate dielectrics," J. Applied Physics 98, 3520(2005).
    85.  K. Choi, P. Lysaght, H.-C. Wen, K. Matthews, H. N. Alshareef, C. Huffman, R. Harris, H. Luan, P. Majhi, and B. H. Lee, "Growth mechanism of ALD-TiN and the thickness dependence of work function," Taiwan VLSI Technology Symposium 2005, 103(2005).
    86.  K. Choi, H.-C. Wen, H. N. Alshareef, R. Harris, P. Lysaght, H. Luan, P. Majhi, and B. H. Lee, "The effect of metal thickness, overlayer and high-k surface treatment on the effective work function of metal electrode,"  European Solid-State Device Research Conference, 101 (2005).
    87.  P. Majhi, H. C. Wen, H. N.Alshareef, K. Choi, R. Harris, P. Lysaght, H. Luan, Y. Senzaki, S. C. Song, B. H. Lee, and C. Ramiller, "Evaluation and integration of metal gate electrodes for future generation dual metal CMOS," IEEE International Conference on Integrated Circuit  Technology, 69-72 (2005).
    88.  P. S. Lysaght, H.-C. Wen, H. N. Alshareef, K. Choi, R. Harris, H. Luan, Y. Senzaki, G. Lian, M. Campin, M. Clark, B. Foran, P. Majhi, and B.-H. Lee, "Physical Characterization of Novel Metal Electrodes for Hf-based Transistors," Characterization and Metrology for ULSI Technology 2005, AIP Conference Proceedings -- September 9, 2005 Volume 788, pp. 136-140
    89.  Z. Zhang, S.C. Song, C. Huffman, J. Barnett, N. Moumen, H.N. Alshareef, P. Majhi, M. Hussain, M. Akbar, J.Sim, S. Bae, B. Sassman, and B.H. Lee, “Interation of Dual Metal gate CMOS Using TaSiN and Ru Metal Gates”, 2005 VLSI Technology Symposium, 50 (2005).
    90.  Z. Zhang, S.C. Song, C. Huffman, M.M. Hussain, J. Barnett, N. Moumen, H.N. Alshareef, P. Majhi, J.H. Sim and B.H. Lee, Electrochem. Solid-State Letters 8, Issue 10, pp. G271-G274 (2005)
    91.  H. C. Wen, K. Choi, P. Lysaght, P. Majhi, H. N. Alshareef, C. Huffman, R. Harris, H. Luan, B. H. Lee, N. Yamada, and S. Wickramanayaka, "Work function engineering of RuHf alloys as gate electrodes for future generation dual metal CMOS," Taiwan VLSI Technology Symposium, 107 (2005).

    92.  H. R. Harris, H. C. Wen, K. Choi, H.N. Alshareef, H. Luan, Y. Senzaki, C. D. Young, S. C. Song, Z. Zhang, G. Bersuker, P. Majhi, and B. H. Lee, "Demonstration of high performance transistors with PVD metal gate,"  European Solid-State Device Research Conference, 2005. pp. 431-434, (2005).
    93.  S. C. Song, B. Lee, Z. Zhang, K. Choi, S. H. Bae, H.N. Alshareef, P. Majhi, H. Wen, J. Bennett, B. Sassman, and P. Zeitzoff, "Comparision of MOSFET Characteristics Between ALD and MOCVD TiN Metal Gate on Hf Silicate," Elechrochemical Society Proceedings, 2005-5, 483 (2005).
    “In-Line Control and Rapid Process Development of Nitrided Gate Oxides” , Characterization and Metrology for ULSI Technology 2005, AIP Conference Proceedings, Vol. 788,172 (2005)
    95.  R. Khamankar, H. Bu, S. Chakravarthi, P. Chidambaram, M. Bevan, A. Krishnan, H. Niimi, B. Smith, J. Blatchford, B. Hornung, J. P. Lu, P. Nicollian, B. Kirkpatrick, D. Miles, D. Farber, H.N. Alshareef, A. Varghese, A. Gurba,  et al. “An Enhanced 90 nm Technology Node with Strong Performance Improvement from Stress and Mobility Increase”, 2004 VLSI Technology Symposium”, 162(2004).
    96.  B.H. Lee, C.D. Young, R. Choi, J.H. Sim, G. Bersuker, C.Y. Kang, R. Harris, G.A. Brown, K. Matthews, S.C. Song, N. Moumen, J. Barnett, P. Lysaght, K.S. Choi, H.C. Wen, C. Huffman, H. N. Alshareef, P. Majhi, S. Gopalan, J. Peterson, P. Kirsh, H.-J. Li, J. Gutt, M. Gardner, H.R. Huff, P. Zeizoff, R. Murto, L. Larson, C. Ramiller, IEDM Technology Symposium,859 (2004).
    97.          H. C. Wen, P. Lysaght, M. J. Campin, B. Foran, C. Huffman, H. N. Alshareef, K. Choi, and P. Majhi, "Thermal Response of Ru Electrodes in Contact with SiO2 and HfSiOx Gate Dielectrics", Proceedings of the Materials Research Society, (2004).
    98.           K.J. Yang, T.J. King, C. Hu, S. Levy, and H.N. Alshareef, “Electron Mobility in MOSFETS with Ultrathin  RTCVD Silicon Nitride/Oxynitride Gate Dielectric”, Solid-State Electronics  47,149(2003). 
    99.          B. Hoerning, R. Khamankar, H. Niimi, M. Goodwin, L. Robertson, D. Miles, B. Kirkpatrick, H.N. AIshareef, A. Varghese, M. Bevan, P. Nicollian , P R. Chidambaram, S. Chakravarthi, A. Gurba, X. Zhang, I. Blatchford, B. Smith, J.P. Lu, J. Deloach, B. Rathsack, C. Bowen, G. Thakar, C. Machala and T. Grider et al. “A High Performance 90 nm Technology With 37 nm Gate Length,” VLSI Technology Symposium 2003, 85(2003).
    100.        A. Karamcheti, V.H.C. Watt, H.N. Alshareef, T.Y. Luo, M.D. Jackson, and H.R. Huff, C. Steinbruchel, “Characterization of Ultrathin Gate Dielectrics formed by In-Situ Team Generation with Nitrogen Postprocessing”, J. Electronic Materials 31, 124(2002).
    101.        F. N. Cubaynes, C.J Dachs, C. Detcheverry, A. Zegers, V.C. Venezia, J. Schmitz,
    P.A. Stolk, M. Jurczak, K. Henson, R. Degraeve, A. Rothschild, T. Conard, J.Petry, M. Da Rold, M. Schaekers, G. Badenes, L. Date, D. Pique, H.N. Al-Shareef, R.W. Murto,Gate Dielectrics for High Performance and Low Power SoC CMOSApplications”, European Solid State Device Research Conference, 427 (2002).
    102.        A. Veloso, M. Jurczak, F. N. Cubaynes, R. Rooyackers, S. Mertens, A. Rothschild,M. Schaekers, H. N. Alshareef, R. W. Murto, C. J. Dachs, RPN Oxynitride Gate Dielectrics for 90 nm Low Power CMOS Applications  European Solid State Device Research Conference, 159 (2002).
    103.        P.Y. Hung, G.A. Brown, X. Zhang, J. Bennett, H. N Alshareef, C. Young, C. Oroshiba, A. Diebold, Metrology Study of Sub 20Å Oxynitride by Corona-Oxide-Silicon (COS) and Conventional C-V Approaches,”  MRS Spring 2002 Conference Proceedings, 716 (2002).
    104.        H.N. Alshareef, A. Karamcheti, T.Y. Luo, G. Bersuker, G.A. Brown, M. Laughery, V. Watt, M.D. Jackson, H. R. Huff, K. Ahmad, R. Jallepally, D. Noble, N. Tam, and G. Miner, “Device Performance of ISSG oxide Gate Dielectrics Nitrided by Remote Plasma Nitridation”, Applied Physics Letters 78, 3875(2001).
    105.        H.N. Alshareef, A. Karamcheti, T.Y. Luo, G. Bersuker, G.A. Brown, M. Laughery, V. Watt, M.D. Jackson, H. R. Huff, K. Ahmad, R. Jallepally, D. Noble, N. Tam, and G. Miner, “Plasma Nitridation of Very Thin Dielectrics” , Microelectronic Engineering  59, 317(2001).
    106.        R.Ahmad-Bitar, S. Abdul Jawad, and H. N. Alshareef, “Characterization of Zn-Doped CdS Thin Films”, Dirasat 28, 22 (2001).
    107.        T.Y. Luo, M. Laughery, G.A. Brown, H.N. Alshareef, V.C. Watt, A. Karamcheti, M.D. Jackson, and H.R. Huff, “Effect of H2 Content on Reliability of Ultrathin in-situ Steam Generated (ISSG) Oxides”  IEEE Electron Device Letters, vol. 21, 382(2000).
    108.        H.N. Alshareef, T.Y. Luo, A. Karamcheti, G.A. Brown, M. Laughery, V. Watt, M.D. Jackson, H.R. Huff, K. Ahmad, R. Jallepally, D. Noble, N. Tam, and G. Miner, “Gate Dielectrics Formed by Remote Plasma Nitridation of In-Situ Steam Generated (ISSG) Oxides”  Proc. of the 198th Electrochemical Society  Meeting 2000-9, 231(2000).
    109.        T.Y. Lou, H.N. Alshareef, G.A. Brown, M. Laughery, V.H.C. Watt, A. Karamcheti, M.D. Jackson, and H.R. Huff, “Correlation Between the Reliability of ISSG SiO2 Oxide and Hydrogen Content”, SPIE Proceedings Vol. 4181, 220(2000).
    110.        T.Y. Lou, H.N. Alshareef, G.A. Brown, M. Laughery, V.H.C. Watt, A. Karamcheti, M.D. Jackson, and H.R. Huff, “Prospective Technology for System-on-a-Chip: N2 Implant Followed by VHP O2 Re-Oxidation”, SPIE Proceedings Vol. 4181, 271(2000).
    111.        T.Y. Lou, H.N. Alshareef, A. Karamcheti, V.H.C Watt, G.A. Brown, M.D. Jackson, H.R. Huff, B. Evans, and D.L. Kwong, “High Performance NMOS Devices Using Ultra-thin VHP OxynitrideSSDM Extended Abstarcts 2000, 178(2000).
    112.        A. Karamcheti, V.H.C. Watt, H.N. Alshareef, T.Y. Luo, G.A. Brown, M.D. Jackson, and H.R. Huff, “Silicon Oxynitride Films as a Segue to the High K Era”, Semiconductor Fabtech 12th Ed., 207(2000).
    113.        H.N. Alshareef and D.B. Dimos "Resistance Degradation in Donor-doped Pb(Zr,Ti)O3 Thin Film Capacitors",  J. Amer. Ceram. Soc. 80, 3127(1997).
    114.        H.N. Alshareef, D. Dimos, M.V. Raymond, and R. W. Schwartz, "Capacitance Tuning and Calculation of the Dielectric Constant of Capacitor Structures with Interdigital Electrodes", J. Electroceramics 1, 145(1997).
    115.        H.N. Alshareef, D. Dimos,and B.A. Tuttle, "Metallization Schemes for Thin Film Decoupling Capacitors", J. Materials Research 12, 347(1997).
    116.      H.N. Alshareef, D. Dimos, T.J. Boyle, W.L. Warren, and B.A. Tuttle, "A Model for the Optical and Electrical Polarization Fatigue of SrBi2Ta2O9", Integrated Ferroelectrics 15, 53(1997).
    117.      T.J. Boyle, H.N. Alshareef, C. D. Buchheit,  R.T. Cygan,  D. Dimos, M. A. Rodriguez, B. Scott, and Joseph W. Ziller D. Dimos, "Nono-Traditional Solution Routes to Ferroelectric materials”, Integrated Ferroelectrics 18, No.1,  213(1997).
    118.        T.J. Boyle and H.N. Alshareef, " A new and Rapid Process for the Production of Solution Derived (Pb,La)(Zr,Ti)O3 Thin Films and Powders", J. Materials  Science 32, 2263(1997).
    119.        M.V. Raymond, H.N. Alshareef, D. Dimos, N. Missert,  and C.H. Mueller, "Sputter Deposition of SrTiO3 for Voltage Tunable Capacitors", Integrated Ferroelectrics 17, 247(1997).
    120.        W. L. Warren, G.E. Pike, D. Dimos, K. Vanheusden, H. N. Alshareef, "Relationships Among Ferroelectric Fatigue, Electronic Charge Trapping, Defect-Dipoles, and Oxygen Vacancies in Perovskite Oxides", Integrated Ferroelectrics 16, 77(1997).
    121.        T.J. Boyle, T.M. Alan, G.J. Moore, C.D. Buchheit, H.N. Alshareef, E.R. Mechenbier, and B.R. Bear, "Nb(V) Alkoxides: Synthesis, Structure, and Characterization", Chemistry of Materials 9, 3187(1997).
    122.        H.N. Alshareef, D. Dimos, T.J. Boyle, W.L. Warren, and B.A. Tuttle, "A Qualitative Model for the Fatigue-Free Behavior of SrBi2Ta2O9", Applied Physics Letters 68, 690(1996).
    123.        H.N. Alshareef, D. Dimos,W.L. Warren, and B.A. Tuttle, "Voltage Offsets and Imprint Mechanism in SrBi2Ta2O9 Thin Films", J. Applied Physics  80, 4573(1996).
    124.        H.N. Alshareef, B.A. Tuttle, W. L. Warren, D. Dimos, M.V. Raymond , and M.A. Rodriguez, "Low Temperature Processing of Nb-doped Pb(Zr,Ti)O3 Capacitors with LSCO Electrodes", Applied  Physics  Letters 68, 272(1996).
    125.        H.N. Alshareef, B.A. Tuttle, W. L. Warren, T.J. Headley, and J.A. Voigt, "Effect of  B-site Cation Stoichiometry on Electrical Fatigue of RuO2/Pb(Zr,Ti)O3/RuO2 Capacitors ", J. Applied Physics  79, 1013(1996).
    126.        H.N. Alshareef and D. Dimos , "Accelerated Life-Time Testing and Resistance Degradation of Thin Film Decoupling Capacitors",  Proceedings of ISAF 10, 421(1996).
    127.        H.N. Alshareef, X. Chen, D.J. Lichtenwalner, and A.I. Kingon, "Analysis of the Oxidation Kinetics and Barrier Layer Properties of  ZrN and Pt/Ru Films for DRAM Applications",  Thin Solid Films 280, 265(1996).
    128.        W. L. Warren, H.N. Alshareef, D. Dimos, and  B.A. Tuttle, "Driving Forces Behind Voltage Shifts in Ferroelectrics", Applied Physics Letters 68, 1681(1996).
    129.        D. Dimos, H.N. Alshareef, W. L. Warren, and  B.A. Tuttle, "Photo-Induced Changes in the Fatigue Behavior of  SrBi2Ta2O9 and Pb(Zr,Ti)O3", J. Applied Physics 80, 272(1996).
    130.        M.V. Raymond, H.N. Alshareef, B.A. Tuttle, and D. Dimos, "RF Magnetron Sputter-Deposition of La1-xSrxCoO3/Pt Composite Electrodes", MRS Symp. Proc. 433,145(1996).
    131.        W.L. Warren, D. Dimos, H.N. Alshareef,  M.V. Raymond, B.A. Tuttle, and G.E. Pike, "Links Between Electrical and Optical Fatigue in Pb(Zr,Ti)O3  Thin Films", J. Amer. Ceram. Soc.  79, 1714(1996).
    132.        B. A. Tuttle, T.J. Headley, H.N. Alshareef, J.A. Voigt, and W. L. Warren, "Microstructure and 90°Domain Assemblages of Pb(Zr,Ti)O3/RuO2 Capacitors as a Function of  Zr  to Ti  Stoichiometry", J. Materials Research 11, 2309(1996).
    133.        W.L. Warren, B.A. Tuttle, D. Dimos H.N. Alshareef, R. Ramesh, and J.T. Evans, "Voltage Shifts and Defect Dipoles in Ferroelectric Capacitors", MRS Symp. Proc. 433, 257(1996).
    134.        D.B. Dimos, S.J. Lockwood, T.J. Garino, H.N. Alshareef, and R.W. Schwartz, "Integrated Decoupling Capacitors using Pb(Zr,Ti)O3 Thin Films", MRS Symp. Proc. 433, 305(1996).
    135.        H.N. Alshareef, K.R. Bellur, O. Auciello, and A. I. Kingon, "Ferroelectric Thin Film Capacitors with Hybrid (Pt, RuO2) Electrodes", J. Applied Physics  77, 2146(1995).
    136.        H.N. Alshareef, Y.L. Chen, O. Auciello, and A. I. Kingon, "Microstructural and Electrical Properties of  Ferroelectric Capacitors  with Pt/RuO2 Hybrid Electrodes", MRS Symp. Proc.  361, 229(1995).
    137.        H.N. Alshareef, O. Auciello, and A. I. Kingon, "The Influence of Pt Interlayers on the Electrical Properties of RuO2/ /Pb(Zr,Ti)O3 / /RuO2 Capacitor Heterostructures", Applied Physics  Letters  66, 239(1995).
    138.        H.N. Alshareef, K.R. Bellur, O. Auciello, and A. I. Kingon, "Electrical Properties of Pb(Zr,Ti)O3 with Modified RuO2 Bottom Electrodes",  Integrated Ferroelectrics 8, 151(1995).
    139.        H.N. Alshareef,  K.R. Bellur, O. Auciello, and A.I. Kingon, "Phase Evolution and Annealing Effects on the Electrical Behavior of PZT Capacitors with RuO2 Electrodes", Thin Solid Films 256, 73(1995).
    140.        H.N. Alshareef, O. Auciello, and A.I. Kingon, "Characterization of Sol-Gel Pb(ZrxTi1-x)O3 Thin Film Capacitors with Hybrid (Pt,RuO2) Electrodes," Science and Technology of Electroceramic Thin Films eds. O. Auciello, R. Waser NATO/ASI, Series E, Applied Science 284, 133 (1995).
    141.        B.A. Tuttle, H.N. Alshareef, W. L. Warren, M.V. Raymond, , and T.J. Headley, "La0.5Sr0.5CoO3 Electrode Technology for Nonvolatile Memories", Microelectronic Eng. 29, 223(1995).
    142.        X. Chen, A. I. Kingon, H.N. Alshareef, K.R. Bellur, K.D. Gifford, and O. Auciello, "Leakage and Interface Engineering in Titanate Thin Films for Nonvolatile Memory Applications",  Integrated Ferroelectrics 7, 291(1995).
    143.        S.R. Summerfelt, D. Kotecki, A. I. Kingon, and H.N. Alshareef, "Pt Hillock Formation and Decay", MRS Symp. Proc. 361, 257(1995).
    144.        O. Auciello, K. D. Gifford, D.J. Lichtenwalner, R. Dat, H. N. Alshareef, K. R. Bellur, A.I. Kingon, “A review of composition-structure-property relationships for PZT-based heterostructure capacitors”,  Integrated Ferroelectrics 6, No. 1, 173(1995).
    145.        C. M. Foster, R. Csencsits, G. R. Bai, L.A. Wills,R. Hiskes, H.N.  Alshareef, and D. Dimos, Structure and properties of heteroepitaxial Pb(Zr 0.35Ti0.65O3)/SrRuO3 multilayer thin films on SrTiO3(100) prepared by MOCVD and RF sputtering “, Integrated Ferroelectrics 10, 31(1995)
    146.        H.N. Alshareef, A. I. Kingon, X. Chen, K. R. Bellur, and O. Auciello, "Contribution of Electrodes and Microstructures to the Electrical Properties of Pb(Zr,Ti)O3 Thin Film Capacitors", J. Materials Research 9, 2968(1994).
    147.        H.N. Alshareef, K. R. Bellur, O. Auciello, and A. I. Kingon, " Effect of Composition and Annealing Conditions on the Electrical Properties of Pb(Zrx ,Ti1-x)O3 Thin Films Deposited by the Sol-Gel Process", Thin Solid Films 252, 38(1994).
    148.        H.N. Alshareef, K. R. Bellur, O. Auciello, and A. I. Kingon, " Effect of Electrodes on the Microstructure and Phase Evolution of  Pb(Zr,Ti)O3 Thin Films", Ferroelectrics 152, 85(1994).
    149.        H.N. Alshareef, K.R. Bellur, O. Auciello, and A.I. Kingon, "Fatigue and Retention of Pb(Zr0.53Ti0.47)O3 Thin Film Capacitors with Pt and RuO2 Electrodes," Integrated Ferroelectrics 5, 185-196 (1994).
    150.        X. Chen, A. I. Kingon, H.N. Alshareef, and K.R. Bellur, "Electrical Transport and  Dielectric Breakdown in Pb(Zr,Ti)O3 Thin Films", Ferroelectrics 151,133(1994).
    151.        S. Summerfelt, D. Kotecki, A.I. Kingon, and H.N. Alshareef, "Pt Hillock Formation and Decay," Mat. Res. Soc. Fall Symp. Proc. Ferroelectric Thin Films IV (1994).
    152.        O. Auciello, H.N. Alshareef, K.D. Gifford, D.J. Lichtenwalner, R. Dat, K.R. Bellur, A.I. Kingon, and R. Ramesh, "A Review of Orientation-Microstructure-Property Relationships for PZT/Metal or Metal-Oxide Layered Heterostructures," Mat. Res. Soc. Spring Symp. Proc. Epitaxial Oxide Thin Films and Heterostructures . Eds D.K. Fork, J. M. Phillips, R. Ramesh, and R.M. Wolf, 341 (1994).
    153.        H.N. Alshareef, K. D. Gifford, P.D. Hren, O. Auciello, and A. I. Kingon, "Electrodes for Ferroelectric Thin Films", Integrated Ferroelectrics 3, 321(1993).
    154.        H.N. Alshareef, K. D. Gifford, P.D. Hren, O. Auciello, and A. I. Kingon, "Bottom Electrodes for PZT Thin Films", Proceedings of ISIF 4, 181(1993).
    155.        A.I. Kingon, H.N. Alshareef, D.J. Lichtenwalner, R. Dat, and O. Auciello, "Current Status of Ferroelectric Thin Film Activities in the USA and Canada," The Sixth U.S.-Japan Seminar on Dielectric and Piezoelectric Ceramics, ed. A. Safari, 9-20 (1993).
    156.        H.N. Alshareef, K.D. Gifford, P.D. Hren, S.H. Rou, O. Auciello, and A.I. Kingon, "Bottom Electrodes for PZT Thin Films," Proc. 4th International Symp. on Integrated Ferroelectrics 181, (1992).
    157.        I. Kingon, H.N. Alshareef, K. D. Gifford, T.M. Graettinger, S. H. Rou, P.D. Hren, and O. Auciello, "Sputter Deposition of  Ferroelectric Thin Films", Integrated Ferroelectrics 2, 361(1992).
    158.        K.D. Gifford, H.N. Alshareef, S. H. Rou, K.D. Gifford, O. Auciello, and A. I. Kingon, "Microstructure and Electrical Properties of PZT Thin Films Deposited by in-situ Ion Beam Sputtering", Mat. Res. Soc. Proc. 243, 191(1992).
    159.        K. R. Bellur, H.N. Alshareef, S. H. Rou, and A. I. Kingon, "Electrical Characterization of Sol-Gel Derived PZT Thin Films", Proceedings of ISAF 8, 448(1992).
    160.        P.D. Hren, H.N. Alshareef, S.H. Rou, and A. I. Kingon, E.A. Irene, "Hillock Formation in
    Platinum Films", Mat. Res. Soc. Proc. 260, 575(1992).
    161.        P.D. Hren, S.H. Rou, H.N. Alshareef, M.S. Ameen, O. Auciello, and A. I. Kingon, , "Bottom Electrodes for Integrated Pb(Zr,Ti)O3 Films", Integrated Ferroelectrics  2,311(1992).
    162.        H.N. Alshareef, K.D. Gifford, M.S. Ameen., O. Auciello, and A. I. Kingon, "Processing and Electrical Characterization of Ion Beam Sputter-Deposited PZT Thin Films", Ceramic Transactions 25, 97(1991).
    163.        T.M. Graettinger, O. Auciello, M.S. Ameen, H.N. Alshareef, K.D.Gifford, O. Auciello, and A. I. Kingon, "Ion Beam Sputtering of  Ferroelectric Oxide Thin Films", MRS Symp. Proc. 223, 273(1991).
    164.        M.S. Ameen , T.M. Graettinger, S.H. Rou,  H.N. Alshareef, K.D.Gifford, O. Auciello, and A. I. Kingon, "Processing and Structural Characterization of Ferroelectric Thin Films Deposited by Ion Beam Sputtering", MRS Symp. Proc. 200, 65(1991).
    165.        Kingon, M.S. Ameen , O. Auciello, K.D.Gifford, H.N. Alshareef,  T.M. Graettinger, S.H. Rou and P.D. Hren, "Processing-Structure Relations for Ferroelectric Thin Films Deposited by Ion Beam Sputter-Deposition", Ferroelectrics 116, 35(1991).
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    Total result(s) found: 216
    • "Vinoth Ramalingam, Purushothaman Varadhan, Hui‐Chun Fu, Hyunho Kim, Daliang Zhang, Shuangming Chen, Li Song, Ding Ma, Yun Wang, Husam N. Alshareef, Jr‐Hau He" Heteroatom‐Mediated Interactions between Ruthenium Single Atoms and an MXene Support for Efficient Hydrogen Evolution
    • ​Adv.Mater.2019, 1903841
    Single atoms; MXene support; Efficient hydrogen evolution
    • "Chen Yang, Jehad, K. El-Demellawi, Jun Yin, Dhinesh Babu Velusamy, Abdul-Hamid M. Emwas, Ahmed M. El-Zohry, Issam Gereige, Ahmed AlSaggaf, Osman M. Bakr, Husam N. Alshareef, Omar F. Mohammed" ​MAPbI3 Single Crystals Free from Hole-Trapping Centers for Enhanced Photodetectivity​
    • ​ACS Energy Lett. 2019, 4, 11, 2579-2584
    MAPbI3 single crystals free; Photodetectivity
    • "Lin Zhou, Jiao Zhang, Yingqiang Wu, Wenxi Wang, Hai Ming, Qujiang Sun, Limin Wang, Jun Ming, Husam N. Alshareef​" Understanding Ostwald Ripening and Surface Charging Effects in Solvothermally‐Prepared Metal Oxide–Carbon Anodes for High Performance Rechargeable Batteries
    • Adv. Energy Mater. 2019, 1902194
    Ostwald ripening, Surface charging effects, Metal oxide–carbon anodes
    • "Seyoung Kee, Md Azimul Haque, Daniel Corzo, Husam N. Alshareef, Derya Baran" Self‐Healing and Stretchable 3D‐Printed Organic Thermoelectrics
    • Adv. Funct. Mater. 2019, 1905426
    Self‐healing; 3D‐printing method; Stretchable organic thermoelectrics
    • “Wojciech Ogieglo, Tiara Puspasari, Mrinal KantiHota, Nimer Wehbe, Husam N.Alshareef, IngoPinnau” Nano-Hybrid Thin-Film Composite Carbon Molecular Sieve Membranes
    • ​ Mater. Today Nano DOI: 10.1016/j.mtnano.2019.100065
    Carbon molecular sieves; Thin-film composite membranes; Gas separation
    • "Jing Guo, Jun Ming, Yongjiu Lei, Yongjiu Lei, Wenli Zhang, Chuan Xia, Yi Cui, Husam N. Alshareef" Artificial Solid Electrolyte Interphase for Suppressing Surface Reactions and Cathode Dissolution in Aqueous Zinc Ion Batteries
    • ​ACS Energy Lett. 2019, 4, 2776−2781
    Atomic layer deposition (ALD); Artificial solid electrolyte interphase (SEI); Zinc ion batteries
    • "Jun Ming, Zhen Cao, Yingqiang Wu, Wandi Wahyudi, Wenxi Wang, Xianrong Guo, Luigi Cavallo, Jang-Yeon Hwang, Atif Shamim, Lain-Jong Li, Yang-Kook Sun, Husam N. Alshareef" New Insight on the Role of Electrolyte Additives in Rechargeable Lithium Ion Batteries
    • ACS Energy Lett. 2019,  4, 11, 2613-2622
    Electrolyte additives; Li+ coordination structure; New insight
    • "Yun-Pei Zhu, Yongjiu Lei, Fangwang Ming, Edy Abou-Hamad, Abdul-Hamid Emwas, Mohamed N. Hedhili, Husam N. Alshareef" Heterostructured MXene and g-C3N4 for high-rate lithium intercalation​
    • ​Nano Energy 65 (2019) 1040302
    Intercalation pseudocapacitance; 2D heterostructure; Electronic structure
    • "Chuan Xia, Peng Zhu, Qiu Jiang, Ying Pan, Wentao Liang, Eli Stavitsk, Husam N. Alshareef & Haotian Wang" Continuous production of pure liquid fuel solutions via electrocatalytic CO2 reduction using solid-electrolyte devices
    • Nature Energyvolume 4, pages776–785 (2019) ​
    liquid fuel; electrocatalytic; CO2 reduction; solid-electrolyte devices
    • "Vincent K.S. Hsiao, Siu-Fung Leung, Yung-Chi Hsiao, Po-Kai Kung, Ying-Chih Lai, Zong-Hong Lin, Khaled N. Salama, Husam N. Alshareef, Zhong Lin Wang, Jr-Hau He" Photo-carrier extraction by triboelectricity for carrier transport layer-free photodetectors
    • ​Nano Energy 65 (2019) 1039585
    Triboelectricity; Photo-carrier extraction; Charge transport layer; Photodetector
    • "Hao Wu. Husam N. Alshareef, Ting Zhu" Photo‐assisted electrochemical hydrogen evolution by plasmonic Ag nanoparticle/nanorod heterogeneity
    • ​InfoMat. 2019;1:417–425.​
    hydrogen evolution, interface, photo-assisted, plasmonic
    • ​"Wenli Zhang, Qiu Jiang, Yongjiu Lei, and Husam N. Alshareef" Wettability-Driven Assembly of Electrochemical Microsupercapacitors
    • ​ACS Appl. Mater. Interfaces 2019, 11, 20905−20914​
    Wettability-Driven; Electrochemical Microsupercapacitors
    • "Zhenwei Wang, Fwzah H. Alshammari, Hesham Omran, Mrinal K. Hota, Hala A. Al-Jawhari, Khaled N. Salama, and Husam N. Alshareef" All‐Oxide Thin Film Transistors and Rectifiers Enabling On‐Chip Capacitive Energy Storage
    • ​Adv. Electron.Mater.2019, 1900531​
    energy storage application, field-effect rectifier, transparent conducting oxides
    • "Zhixiong Liu, Yunpei Zhu, Jehad K. El-Demellawi, Dhinesh Babu Velusamy, Ahmed M. El-Zohry, Osman M. Bakr, Omar F. Mohammed,* and Husam N. Alshareef" Metal Halide Perovskite and Phosphorus Doped g-C3N4 Bulk Heterojunctions for Air-Stable Photodetectors
    • ​ACS Energy Lett. 2019, 4, 2315−2322​
    Perovskite; g‑C3N4; Heterojunctions; Photodetectors
    • "Wenli Zhang, Fan Zhang, Fangwang Ming, Husam N.Alshareef" Sodium-ion battery anodes: Status and future trends​
    • ​EnergyChem1,100012(2019)
    • "Seunghyun Hong,† Fangwang Ming,‡ Yusuf Shi,† Renyuan Li,† In S. Kim,§ Chuyang Y. Tang,∥ Husam N. Alshareef,*,‡ and Peng Wang" Two-Dimensional Ti3C2Tx MXene Membranes as Nanofluidic Osmotic Power Generators​
    • ​ACS Nano 2019, 13, 8917−8925​
    2D; MXene; Nanofluidic; Osmotic Power Generators
    • "Shaobo Tu,† Qiu Jiang,† Junwei Zhang, Xin He, Mohamed Nejib Hedhili, Xixiang Zhang,*and Husam N. Alshareef" Enhancement of Dielectric Permittivity of Ti3C2Tx MXene/Polymer Composites by Controlling Flake Size and Surface Termination
    • ​ACS Appl. Mater. Interfaces 2019, 11, 27358−27362​
    Dielectric Permittivity; MXene; Ti3C2
    • "Mohamad I. Nugraha, Hyunho Kim, Bin Sun, Saheena Desai, F. Pelayo Garcia de Arquer,  Edward H. Sargent,  Husam N. Alshareef, Derya Baran" Highly Passivated n‐Type Colloidal Quantum Dots for Solution‐Processed Thermoelectric Generators with Large Output Voltage
    • ​Adv. Energy Mater.2019, 9, 1901244​
    colloidal quantum dots, ligands, n-type thermoelectrics, solution-processed semiconductors, thermoelectric generators
    • "Wenli Zhang, Jun Ming, Wenli Zhao, Xiaochen Dong, Mohamed N. Hedhili, Pedro M. F. J. Costa, and Husam N. Alshareef" Graphitic Nanocarbon with Engineered Defects for High‐Performance Potassium‐Ion Battery Anodes
    • ​Adv. Funct. Mater.2019, 29, 1903641​
    anodes, defect-rich, graphitic nanocarbon, nanobubbles, potassium-ion batteries
    • "Xiaotian Guo, Yi-Zhou Zhang, Fan Zhang, Qing Li, Dalaver H. Anjum, Hanfeng Liang, Yong Liu, Chun-sen Liu, Husam N. Alshareef * and Huan Pang​" A novel strategy for the synthesis of highly stable ternary SiOx composites for Li-ion-battery anodes
    • ​J. Mater. Chem. A, 2019, 7, 15969-15974​
    SiOx, Lithium ion batteries; highly stable
    • "Dhinesh Babu Velusamy, Jehad K. El‐Demellawi, Ahmed M. El‐Zohry, Andrea Giugni, Sergei Lopatin, Mohamed N. Hedhili, Ahmed E. Mansour, Enzo Di Fabrizio, Omar F. Mohammed, Husam N. Alshareef" MXenes for Plasmonic Photodetection
    • Adv.Mater.2019, 31, 1807658​
    flexible photodetectors, low-frequency Raman spectroscopy, molybdenum carbide, MXenes, surface plasmons
    • "Shaobo Tu, Qiu Jiang,  Xixiang Zhanga, and  Husam N. Alshareef" Solid state MXene based electrostatic fractional capacitors
    • ​Appl. Phys. Lett. 114, 232903 (2019);​
    MXene; solid state; capacitor
    • "Jun Ming, Zhen Cao, Qian Li, Wandi Wahyudi, Wenxi Wang, Luigi Cavallo, Kang-Joon Park, Yang-Kook Sun*, Husam N. Alshareef*​" Molecular-Scale Interfacial Model for Predicting Electrode Performance in Rechargeable Batteries
    • ​ACS Energy Lett.2019471584-1593​
    rechargeable batteries; SEI
    • "Fangwang Ming, Hanfeng Liang, Wenli Zhang, Jun Ming, Yongjiu Lei, Abdul-Hamid Emwas, Husam N. Alshareef​" Porous MXenes enable high performance potassium ion capacitors
    • ​Nano Energy 62 (2019) 853–860855

    Porous MXene; V2C MXene; Potassium ion capacitor; Energy storage
    • "Qiu Jiang, Narendra Kurra, Kathleen Maleski, Yongjiu Lei, Hanfeng Liang, Yizhou Zhang, Yury Gogotsi, Husam N. Alshareef" On-Chip MXene Microsupercapacitors for AC-Line Filtering Applications
    • ​​Adv. Energy Mater.2019, 9, 1901061​
    ac-line filtering, high rate, microsupercapacitors, MXene
    • "Xiangming Xu, Gobind Das, Xin He, Mohamed Nejib Hedhili, Enzo Di Fabrizio, Xixiang Zhang, Husam N. Alshareef" High-Performance Monolayer MoS2 Films at the Wafer Scale by Two-Step Growth
    • ​Adv. Funct. Mater.2019, 29, 1901070​
    excitons, monolayer MoS2, transistors, two-step process, wafer scale
    • "​Xinwei Guan, Zhenwei Wang, Mrinal K. Hota, Husam N. Alshareef, Tom Wu" P‐Type SnO Thin Film Phototransistor with Perovskite‐Mediated Photogating
    • ​Adv. Electron.Mater.2019, 5, 1800538​
    heterojunctions; hybrid perovskites; interfaces; phototransistors; tin monoxide
    • "Mahmoud N. Almadhoun, Mohammad A. Khan, Karam Rajab, Ji Hoon Park, Jillian M. Buriak, Husam N. Alshareef " UV‐Induced Ferroelectric Phase Transformation in PVDF Thin Films
    • ​Adv. Electron.Mater.2019, 5, 1800363​
    beta; ferroelectric; organic electronics; photonic; polyvinylidene fluoride (PVDF); UV
    • "Jin Zhao, Yi‐Zhou Zhang, Fan Zhang, Hanfeng Liang, Fangwang Ming, Husam N. Alshareef, Zhiqiang Gao" Partially Reduced Holey Graphene Oxide as High Performance Anode for Sodium‐Ion Batteries​
    • ​Adv. Energy Mater.2019, 9, 1803215​
    anode materials; energy storage; holey graphene oxide; oxygenous groups; sodium‐ion batteries
    • "Dong Guo, Fangwang Ming, Hang Su, Yingqiang Wu, Wandi Wahyudi, Mengliu Li, Mohammed N. Hedhili, Guan Sheng, Lain-Jong Li, Husam N. Alshareef, Yangxing Li, Zhiping Lai" MXene based self-assembled cathode and antifouling separator for high-rate and dendrite-inhibited Li–S battery
    • ​Nano Energy 61 (2019) 478–485​
    Lithium–sulfur battery; 2D MXene; Antifouling separator; Self-assembled channels
    • "​Jianmin Li, Ariana Levitt, Narendra Kurra, Kevin Juan, Natalia Noriega, Xu Xiao, Xuehang Wang, Hongzhi Wang, Husam N. Alshareef, Yury Gogotsi" MXene-conducting polymer electrochromic microsupercapacitors​
    • ​Energy Storage Materials​,
    MXene; Conducting polymer; Electrochromic; On-chip; Energy storage
    • "Mrinal K. Hota, Qiu Jiang, Zhenwei Wang, Zhong Lin Wang, Khaled N. Salama, Husam N. Alshareef" Integration of Electrochemical Microsupercapacitors with Thin Film Electronics for On‐Chip Energy Storage
    • ​Adv.Mater.2019, 1807450​
    microsupercapacitors; on‐chip energy storage; RuO2; thin film rectifiers; thin film transistors
    • "Hanfeng Liang, Zhen Cao, Fangwang Ming, Wenli Zhang, Dalaver H. Anjum, Yi Cui,
      Luigi Cavallo, and Husam N. Alshareef" Aqueous Zinc-Ion Storage in MoS2 by Tuning the Intercalation Energy
    • ​Nano Lett., 2019, 19 (5), pp 3199–3206​
    hydrophilicity engineering; interlayer spacing tuning; MoS2; oxygen incorporation; zinc-ion battery; Zn2+ intercalation
    • "Hui‐Chun Fu, Vinoth Ramalingam, Hyunho Kim, Chun‐Ho Lin, Xiaosheng Fang, Husam N. Alshareef, Jr‐Hau He" MXene‐Contacted Silicon Solar Cells with 11.5% Efficiency
    • ​Adv. Energy Mater. 2019, 1900180​
    2D materials; electrodes; metal contact; MXene; solar cells
    • "Hao Wu, Wenli Zhang, Sharath Kandambeth, Osama Shekhah, Mohamed Eddaoudi, Husam N. Alshareef" Conductive Metal–Organic Frameworks Selectively Grown on Laser-Scribed Graphene for Electrochemical Microsupercapacitors
    • ​Adv. Energy Mater.2019, 1900482​
    conductive; graphene; laser‐scribed; metal–organic frameworks; microsupercapacitors
    • "Seyoung Kee, Hyunho Kim, Sri Harish Kumar Paleti, Abdulrahman El Labban, Marios Neophytou, Abdul-Hamid Emwas, Husam N. Alshareef, and Derya Baran" Highly Stretchable and Air-Stable PEDOT:PSS/Ionic Liquid Composites for Efficient Organic Thermoelectrics
    • ​Chem. Mater., DOI: 10.1021/acs.chemmater.9b0081​
    PEDOT:PSS; Stretchable; Thermoelectrics
    • "Yongjiu Lei, Wenli Zhao, Yizhou Zhang, Qiu Jiang, Jr‐Hau He, Antje J. Baeumner, Otto S. Wolfbeis, Zhong Lin Wang, Khaled N. Salama, Husam N. Alshareef" A MXene‐Based Wearable Biosensor System for High‐Performance In Vitro Perspiration Analysis
    • Small, DOI: 10.1002/smll.201901190​
    biosensor, MXene, perspiration analysis, wearable device
    • "Steven L. Zhang, Qiu Jiang, Zhiyi Wu, Wenbo Ding, Lei Zhang, Husam N. Alshareef, Zhong Lin Wang" Energy Harvesting‐Storage Bracelet Incorporating Electrochemical Microsupercapacitors Self‐Charged from a Single Hand Gesture
    • ​Adv. Energy Mater. DOI: 10.1002/aenm.201900152​
    Energy Harvesting; Microsupercapacitors; Self‐Charge; Triboelectric nanogenerator
    • "Hyunho Kim, Zhenwei Wang, Husam N. Alshareef" MXetronics: Electronic and photonic applications of MXenes
    • ​Nano Energy 60 (2019) 179–197​
    MXene; MXetronics; Electronic; Photonic; Plasmonic
    • "Shaobo Tu, Fangwang Ming,  Junwei Zhang, Xixiang Zhang,  Husam N. Alshareef" MXene‐Derived Ferroelectric Crystals
    • Adv.Mater.2019, 1806860​
    ferroelectricity; hydrothermal synthesis; MAX phase; MXene‐derived; single crystal
    • "Md Azimul Haque. Appala Naidu Gandi, Rajeshkumar Mohanraman, Yakui Weng, Bambar Davaasuren, Abdul‐Hamid Emwas, Craig Combe, Derya Baran, Alexander Rothenberger, Udo Schwingenschlögl, Husam N. Alshareef, Shuai Dong, Tom Wu" A 0D Lead‐Free Hybrid Crystal with Ultralow Thermal Conductivity
    • ​Adv. Funct. Mater. 2019, 1809166​
    0D; hybrid material; tetraiodide; thermal conductivity
    • ​"Mohamad I. Nugraha, Hyunho Kim, Bin Sun, Md Azimul Haque, Francisco Pelayo Garcia de Arquer, Diego Rosas Villalva, Abdulrahman El‐Labban, Edward H. Sargent, Husam N. Alshareef, Derya Baran” Low‐Temperature‐Processed Colloidal Quantum Dots as Building Blocks for Thermoelectrics
    • ​Adv. Energy Mater.2019, 1803049​
    colloidal quantum dots; power factor; quantum dot thermoelectrics; solution processable materials; thermoelectrics
    • “Peng Yang, Wenli Zhao, Aleksander Shkurenko§, Youssef Belmabkhout§, Mohamed Eddaoudi§, Xiaochen Dong, Husam N. Alshareef, and Niveen M. Khashab” Polyoxometalate–Cyclodextrin Metal–Organic Frameworks: From Tunable Structure to Customized Storage Functionality
    • ​J. Am. Chem. Soc., 2019, 141 (5), pp 1847–1851​​
    Polyoxometalate; MOF; Lithium ion battery
    • "Wenli Zhang, Yongjiu Lei, Qiu Jiang, Fangwang Ming, Pedro M. F. J. Costa, Husam N. Alshareef" 3D Laser Scribed Graphene Derived from Carbon Nanospheres: An Ultrahigh‐Power Electrode for Supercapacitors
    • ​Small Methods 2019, 1900005, DOI: 10.1002/smtd.201900005​
    carbon nanospheres; high power performance; hydrothermal carbonization; laser scribed graphene; supercapacitors
    GrapheneLaser; writingEnergy; Sensor; Electrocatalysis; Electronics
    • "Jun Ming, Jing Guo, Chuan Xia, Wenxi Wang, Husam N. Alshareef" Zinc-ion batteries: Materials, mechanisms, and applications​
    • ​​Materials Science & Engineering R 135 (2019) 58–84​
    Zinc-ion batteries; Cathode; Electrolyte; Anode; Flexible batteries; Wearable devices
    • "Evan Quain, Tyler S. Mathis, Narendra Kurra, Kathleen Maleski, Katherine L. Van Aken, Mohamed Alhabeb, Husam N. Alshareef, Yury Gogotsi" Direct Writing of Additive-Free MXene-in-Water Ink  for Electronics and Energy Storage
    • ​Adv.Mater. Technol.2019, 4, 1800256​
    direct‐write; micro‐supercapacitors; MXene ink; paper electronics; printing
    • "Jin Zhao, Yi‐Zhou Zhang, Fan Zhang, Hanfeng Liang, Fangwang Ming, Husam N. Alshareef, Zhiqiang Gao" Partially Reduced Holey Graphene Oxide as High Performance Anode for Sodium‐Ion Batteries
    • ​Adv. Energy Mater. 2018, 1803215​
    anode materials, energy storage, holey graphene oxide, oxygenous groups, sodium‐ion batteries
    • ​"Martha I. Serna, Syed M. N. Hasan, S. Nam, Lidia El Bouanani, Salvador Moreno, Hyunjoo Choi, Husam N. Alshareef, Majid Minary-Jolandan, Manuel A. Quevedo‐Lopez" Low‐Temperature Deposition of Layered SnSe2 for Heterojunction Diodes
    • ​Adv. Mater. Interfaces 2018, 5, 1800128,​
    layered metal dichalcogenides, metal dichalcogenide diodes, pulsed laser deposition, SnSe2 thin films
    • "Yun-Pei Zhu, Chuan Xia, Yongjiu Lei, Nirpendra Singh, Udo Schwingenschlögl, Husam N. Alshareef" Solubility contrast strategy for enhancing intercalation pseudocapacitance in layered MnO2 electrodes
    • ​Nano Energy 56 (2019) 357–364​
    Salt effect, Oxygen vacancy, Nanostructure control, Modified pseudocapacitance
    • ​"Fwzah H. Alshammari, Mrinal K. Hota, Husam N. Alshareef" Transparent Electronics Using One Binary Oxide for All Transistor Layers​​
    • ​Small2018, 14, 1803969​,​​​
    thin film transistors, transparent dielectric oxides, transparent electronics, transparent multilayer semiconducting channel, transparent oxide contacts
    • ​"Xiangming Xu, Zhenwei Wang, Sergei Lopatin, Manuel A Quevedo-Lopez and Husam N Alshareef" Wafer scale quasi single crystalline MoS2 realized by epitaxial phase conversion
    • ​2D Mater. 6 (2019) 015030,​
    molybdenum dioxide, molybdenum disulfide, quasi-single crystalline, polycrystalline, wafer scale
    • "Chueh-Han Wang, Narendra Kurra, Mohamed Alhabeb, Jeng-Kuei Chang,
      Husam N. Alshareef, and Yury Gogotsi" Titanium Carbide (MXene) as a Current Collector for Lithium-Ion Batteries
    • ​ACS Omega 2018, 3, 12489−12494​
    Titanium carbide; MXene; current collector; Lithium ion battery
    • "Fangwang Ming, Hanfeng Liang, Yongjiu Lei, Sharath Kandambeth, Mohamed Eddaoudi,
      and Husam N. Alshareef" Layered MgxV2O5·nH2O as Cathode Material for High-Performance Aqueous Zinc Ion Batteries

    • ​ACS Energy Lett. 2018, 3, 2602−2609​
    Zinc-ion batteries; aqueous; vanadium oxide; layered material
    • "Xinwei Guan, Zhenwei Wang, Mrinal K. Hota, Husam N. Alshareef, and Tom Wu" P‐Type SnO Thin Film Phototransistor with Perovskite‐Mediated Photogating
    • ​Adv. Electron. Mater.​, DOI: 10.1002/aelm.201800538​
    heterojunctions, hybrid perovskites, interfaces, phototransistors, tin monoxide
    • "Mahmoud N. Almadhoun, Mohammad A. Khan, Karam Rajab, Ji Hoon Park, Jillian M. Buriak, Husam N. Alshareef" UV‐Induced Ferroelectric Phase Transformation in PVDF Thin Films
    • ​Adv. Electron. Mater. ​DOI: 10.1002/aelm.201800363​
    beta, ferroelectric, organic electronics, photonic, polyvinylidene fluoride (PVDF), UV
    • "Ji Hoon Park, Husam N. Alshareef, Mohd A. KHAN, Ihab N. Odeh" Non-volatile ferroelectric memory cells with multilevel operation
    • ​ Patent No . : US 10,068,630 B2
    Ferroelectric; transistors; memory cell
    • "Ghada H. Ahmed, Jehad K. El-Demellawi, Jun Yin, Jun Pan, Dhinesh Babu Velusamy, Mohamed Nejib Hedhili, Erkki Alarousu, Osman M. Bakr, Husam N. Alshareef, and Omar F. Mohammed" Giant Photoluminescence Enhancement in CsPbCl3 Perovskite Nanocrystals by Simultaneous Dual-Surface Passivation
    • ​ACS Energy Lett. 2018, 3, 2301−2307​
    CsPbCl3; perovskite; Photoluminescence
    • ​​"Evan Quain, Tyler S. Mathis, Narendra Kurra, Kathleen Maleski, Katherine L. Van Aken, Mohamed Alhabeb, Husam N. Alshareef, Yury Gogotsi" Direct Writing of Additive‐Free MXene‐in‐Water Ink for Electronics and Energy Storage
    • ​Adv. Mater. Technol.,  DOI: 10.1002/admt.201800256​
    direct-write, micro-supercapacitors, MXene ink, paper electronics, printing
    • "Chuan Xia, Zifeng Lin, Yungang Zhou, Chao Zhao, Hanfeng Liang, Patrick Rozier, Zhiguo Wang, and Husam N. Alshareef" ​Large Intercalation Pseudocapacitance in 2D VO2 (B): Breaking through the Kinetic Barrier
    • Adv. Mater., DOI: 10.1002/adma.201803594
    2D materials; VO2(B); Pseudocapacitance; energy storage
    • "Fangwang Ming, Hanfeng Liang, Yongjiu Lei, Wenli Zhang, Husam N. Alshareef" Solution synthesis of VSe2 nanosheets and their alkali metal ion storage performance
    • ​Nano Energy 53, Pages 11-16
    VSe2; Solution synthesis; 2D materials; Energy storage
    • "Hanfeng Liang, Fangwang Ming, Husam N. Alshareef​" Applications of Plasma in Energy Conversion and Storage Materials
    • ​Adv. Energy Mater., DOI: 10.1002/aenm.201801804​
    Plasma, Energy storage and conversion, electrochemical
    • "Wenli Zhang, Yongjiu Lei, Fangwang Ming, Qiu Jiang, Pedro M. F. J. Costa,  Husam N. Alshareef" Lignin Laser Lithography: A Direct‐Write Method for Fabricating 3D Graphene Electrodes for Microsupercapacitors
    • ​​Adv. Energy Mater., DOI: 10.1002/aenm.201801840​
    3D Graphene, laser scribed, lignin, microsupercapacitor
    • "Sergei Lopatin, Jehad K. El-Demellawi and Husam N. Alshareef" Multipolar Surface Plasmons in 2D Ti3C2Tx Flakes: an Ultra-High Resolution EELS with Conventional TEM and In-Situ Heating Study
    • ​Microscopy and Microanalysis​, doi:10.1017/S1431927618008371
    Ti3C2, Mxene, EELS, in-situ TEM
    • "Narendra Kurra, Mohamed Alhabeb, Kathleen Maleski, Chueh-Han Wang, Husam N. Alshareef, and Yury Gogotsi" Bistacked Titanium Carbide (MXene) Anodes for Hybrid Sodium-Ion Capacitors
    • ​ACS Energy Lett. 2018, 3, 2094−2100​
    Ti3C2, Mxene, sodium ion capacitor
    • ​"Jehad K. El-Demellawi, Sergei Lopatin,§ Jun Yin, Omar F. Mohammed, and Husam N. Alshareef" Tunable Multipolar Surface Plasmons in 2D Ti3C2Tx MXene Flakes
    • ACS Nano​, DOI: 10.1021/acsnano.8b04029
    in situ heating STEM; independent polarizability; low-loss/core-loss EELS; surface plasmon blue-shift; temperature-dependent STEM-EELS
    • "Yi-Zhou Zhang, Kang Hyuck Lee, Dalaver H. Anjum, Rachid Sougrat, Qiu Jiang, Hyunho Kim and Husam N. Alshareef" MXenes stretch hydrogel sensor performance to new limits​
    • ​Science Advances, DOI: 10.1126/sciadv.aat0098​
    MXene, hydrogel, sensor
    • "Fan Zhang, Eman Alhajji, Yongjiu Lei, Narendra Kurra, Husam N. Alshareef" Highly Doped 3D Graphene Na‐Ion Battery Anode by Laser Scribing Polyimide Films in Nitrogen Ambient
    • ​​Adv. Energy Mater., DOI: 10.1002/aenm.201800353​
    N-doping, graphene, laser scribing, sodiun ion battery
    • "Pranati Nayak,‡ Qiu Jiang,‡ Rajeshkumar Mohanraman,‡ Dalaver Anjum, Mohamed Nejib Hedhili and Husam N. Alshareef" Inherent electrochemistry and charge transfer properties of few-layered two-dimensional Ti3C2Tx MXene
    • ​Nanoscale, DOI: 10.1039/c8nr01883a​​​
    Ti3C2, MXene, electrochemical